Applied a capacitively coupled RF plasma operated at two or 3 orders of magnitude bigger strain configuration, enabling better radical densities in closer proximity to the substrate. These higher radical densities result in bigger radical fluxes deeper within the trench, maximizing the conformality. Table I and Fig. eight overview differing https://atomiclayerdeposition60360.link4blogs.com/41596659/considerations-to-know-about-atomic-layer-deposition