Likewise, process parameters and properties of copper films deposited from precursors applying key ligand devices such as aminoalkoxides, amidinates, guanidinates, betadiketonates and betaketoiminates are offered. Surface chemistry is examined within the standpoint on the similarities of CVD and ALD, considering precursors which might be Utilized in both of those forms https://ald-advancements59369.blogsumer.com/22107291/a-review-of-atomic-layer-growth